作者：C.RichardBrundle，C
页数：211
出版社：哈尔滨工业大学出版社
出版日期：2014
ISBN：9787560342795
电子书格式：pdf/epub/txt
内容简介
characterization in optica/ materia/s provides information for understanding the properties and performance of optical materials under the influence of the various characterization techniques. surface and interfacial properties are key to the optical response of a material， and their control and modification during materials processing is necessary to achieve desired behavior. characterization of optica/ materia/s focuses on how surface morphology， microstructure， and chemical bonding influence the optical response of a material， and it illuminates methods used to characterize thin films， multilayer structures， and modified surfaces，
本书特色
光学材料表征一书提供了关于在不同表征技术影响下理解光学材料的性能与特性方面的知识。表面与界面性质对材料的光响应是非常重要的，为实现所需性能在材料加工过程中对他们进行控制与修饰是必要的。《光学材料的表征》(作者布伦德尔、埃文斯、伊莎霍斯)一书集中介绍了表面形貌、微观结构及化学键是如何影响材料的光响应，它介绍了用于表征薄膜、多层结构与改性表面的方法。
目录
preface to series
preface to the reissue of characterization of optical materials
preface
contributors
introduction
part 1 influence of surfacemorphologyand
microstructure on optical response
characterization of surface roughness
1.1 introduction
1.2 whatsurfaceroughnessls
1.3 howsurfaceroughness affctsopticaimeasurements
1.4 how surface roughness and scatteringare measured
1.5 characterization ofselected surfaces
1.6 future difections
characterization of the near-surface region using poiarization-sensitive optical techniques
2.1 introduction
2.2 ellipsometry
experimentallmplementationsofellipsometry 29, analysisof
ellipsometrydata
2.3 microstructuraldeterminationsfromellipsometrydata
temperature dependence ofthe opticat properties ofsilicon 34,
determination ofthe optical functions ofglasses using se 35,
spectroscopicellipsometrystudiesofsi02/si 37, spectroscopic
ellipsometryforcomplicatedfilmstrucrures 38, time-resolved
ellipsometry 40, single-wavelengthreal-timemonitoringoffilm
growth 41, multiple-wavelengthreal-timemonitoringoffilm
growth 42, infrared ellipsometrystudies offilm growth
the composition, stoichiometry, and related microstructure of optical materials
3.1 introduction
3.2 aspectsoframanscattering
3.3 iii-vsemiconductor systems
3.4 groupivmaterials
3.5 amorphous and microcrystalline semiconductors
chalcogenideglasses 60, groupivmicrocrystallinesemiconductors
3.6 summary
diamond as an optical material
4.1 introduction
4.2 depositionmethods
4.3 0pticalpropertiesofcvd diamond
4.4 defectsin cvd diamond
4.5 polishingcvd diamond
4.6 x-raywindow
4.7 summary
part 2 stability and modification of film and surface optical properties
multijayer optical coatings
5.1 introduction
5.2 single-layeropticalcoatings
opticaiconstants 90, compositionmeasurementtechniques
5.3 multilayeropticalcoatings
compositionaianalysis 107, surfaceanalyticaitechniques 108,
microstructuralanalysis ofmultilayer optical coatings
5.4 stabilityofmultilayeropticalcoatings
5.5 future compositional and
microstructuralanalyticaitechniques
characterization and control of stress in optical films
6.1 introduction
6.2 0rigins ofstress
……
