作者：汤如俊编著
页数：133页
出版社：苏州大学出版社
出版日期：2021
ISBN：9787567235793
电子书格式：pdf/epub/txt
内容简介
本书较全面地介绍了有关薄膜材料制备技术的基础知识，总结了近年来薄膜材料制备领域的新进展，并融入了编著者多年来从事薄膜材料研究中所取得的成果。在第一章中，主要介绍了薄膜材料的基本概念、特征，并扼要介绍了薄膜材料的物性和结构的分析方法。第二章和第三章讲述重要的预备知识，即真空技术和等离子体技术。第四、第五章着重讨论了制备薄膜材料的物理气相沉积技术和化学气相沉积技术的基本原理和方法，包括蒸发、溅射、离子束、脉冲激光和等离子体化学气相沉积技术。第六章则讨论了薄膜材料的厚度和沉积速率的检测方法。在最后的第七到第十章中，重点地介绍了当前国际上研究的几种热点薄膜材料，如低介电常数薄膜、铁电薄膜、氧化锌发光薄膜和二维材料等的制备方法、结构和性质。
目录
1．1 Definition of films
1．2 Surface effect
1．3 Thin film structures and defects
1．4 Basic requirements to make a thin film
Exercises
Chapter 2 Vacuum Technology Foundation
2．1 Basic concepts of vacuum
2．2 Dynamics of gas
2．3 Gas flow and gas extraction
2．4 Vacuum acquisition
2．5 Vacuum measurement
Exercises
Chapter 3 Plasma Technology Basis
3．1 Basic concepts of plasma
3．2 Classification of plasma
3．3 Occurrence of low-temperature plasma
Exercises
Chapter 4 Physical Vapor Deposition of Thin Films
4．1 Evaporation deposition
4．2 Sputtering deposition
4．3 Ion-beam deposition
4．4 Pulsed-laser deposition
4．5 Molecular-beam epitaxy
Exercises
Chapter 5 Chemical-vapor Deposition
5．1 Thermochemical-vapor deposition
5．2 Plasma-enhanced chemical-vapor deposition
5．3 High-density plasma chemical-vapor deposition
5．4 Other chemical-vapor deposition
Exercises
Chapter 6 Kinetics of the Process of Thin Film Growth
6．1 Four steps of thin film growth
6．2 Adsorption
6．3 Surface diffusion
6．4 Nucleation and growth of 2D islands
6．5 Crystallization and film growth
6．6 Growth modes
6．7 Structure development
6．8 Interfaces
Exercises
Chapter 7 Measurement of Film Thickness and Deposition Rate
7．1 Optical method
7．2 Balance method
7．3 Electrical method
7．4 Surface-roughness-meter method
Exercises
Chapter 8 Recent Advances of Thin Film Materials and Technology
8．1 Recent advances in thin film fabrication technologies
8．2 Some important electronic thin film materials
8．3 Progresses of two-dimensional thin film materials
Exercises
References
